La Roche Posay UVSPORT Wet & Sweat Pro-Resistance Lotion SPF50+ a very high UV protection designed to withstand even high-intensity activities. Formulated with Antioxidant Vitamin E + Glycerin + LRP Thermal Water: this formula works to hydrate the skin and help protect the skin barrier Powered by Wetskin Technology, it allows the product to be applied even on sweat or wet skin. Up to 8H hydration*, it protects skin from discomforts caused by salt & chlorine dehydration. Up to 80 minutes water resistance. Re-apply frequently and generously. Benefits Very high SPF50+ broad-spectrum sun protection Designed for sport and high-intensity outdoor activity Wetskin Technologyallows application on wet or sweaty skin Water and sweat resistant formula Enriched withVitamin Eto help protect against environmental stress Glycerinhelps hydrate and maintain skin comfort Suitable for face and body Dermatologically tested for sensitive skin Directions Apply the sunscreen product just before exposure. Re-apply frequently and generously to maintain protection, especially after swimming, perspiring or towelling. Ingredient AQUA / WATER / EAU ISOPROPYL PALMITATE ALCOHOL DENAT. BIS-ETHYLHEXYLOXYPHENOL METHOXYPHENYL TRIAZINE DICAPRYLYL ETHER ETHYLHEXYL TRIAZONE BUTYL METHOXYDIBENZOYLMETHANE DIISOPROPYL ADIPATE DIISOPROPYL SEBACATE GLYCERIN PROPANEDIOL TRIETHANOLAMINE PHENYLBENZIMIDAZOLE SULFONIC ACID DIMETHICONE TOCOPHEROL OXIDIZED STARCH ACETATE COPERNICIA CERIFERA CERA / CARNAUBA WAX / CIRE DE CARNAUBA ORYZA SATIVA CERA / RICE BRAN WAX C12-22 ALKYL ACRYLATE/HYDROXYETHYLACRYLATE COPOLYMER ACRYLATES COPOLYMER ACRYLATES/C10-30 ALKYL ACRYLATE CROSSPOLYMER ACRYLATES/DIMETHICONE COPOLYMER CAPRYLYL GLYCOL CARRAGEENAN DIETHYLAMINO HYDROXYBENZOYL HEXYL BENZOATE DISODIUM PHOSPHATE DROMETRIZOLE TRISILOXANE HYDROXYACETOPHENONE HYDROXYETHYLCELLULOSE POLYSORBATE 60 SODIUM CHLORIDE SODIUM PHOSPHATE TEREPHTHALYLIDENE DICAMPHOR SULFONIC ACID TRISODIUM ETHYLENEDIAMINE DISUCCINATE XANTHAN GUM PARFUM / FRAGRANCE

Add a Review

Your email address will not be published. Required fields are marked *